Fraunhofer CSP developing new patent infringement investigation methods for PV technologies

The German research institute is working on developing advanced, high-resolution material and thin film characterization methods that may become a set of simplified and rapid measurement procedures for routine use in intellectual property investigations. Germany's Fraunhofer Center for Silicon Photovoltaics (Fraunhofer CSP) is developing a range of high-resolution material and thin film microscopic and nanoscopic characterization methods to use in patent infringement analysis of higher efficiency solar PV products. The work belongs to a project known in Germany as IP-Schutz. The project, which ...

Den vollständigen Artikel lesen ...